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    Structural and electrical properties of AlN films deposited using reactive RF magnetron sputtering for solar concentrator application

    New search for: Kale, A.
    New search for: Brusa, R. S.
    New search for: Miotello, A.

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    Structural and electrical properties of AlN films deposited using reactive RF magnetron sputtering for solar concentrator application

    New search for: Kale, A.
    New search for: Brusa, R. S.
    New search for: Miotello, A.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Structural and electrical properties of AlN films deposited using reactive RF magnetron sputtering for solar concentrator application

    New search for: Kale, A.
    New search for: Brusa, R. S.
    New search for: Miotello, A.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Structural and electrical properties of AlN films deposited using reactive RF magnetron sputtering for solar concentrator application

    Contributors:

    Kale, A. (author) / Brusa, R. S. (author) / Miotello, A. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 258 ; 3450-3454

    Publication date:

    2012-01-01

    Size:

    5 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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