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Ti-Si-N films prepared by magnetron sputtering

Pan, L. / Bai, Y. / Zhang, D. / Wang, J.

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Ti-Si-N films prepared by magnetron sputtering

Pan, L. / Bai, Y. / Zhang, D. / Wang, J.

Ti-Si-N films prepared by magnetron sputtering

Pan, L. / Bai, Y. / Zhang, D. / Wang, J.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Ti-Si-N films prepared by magnetron sputtering

Contributors:

Pan, L. (author) / Bai, Y. (author) / Zhang, D. (author) / Wang, J. (author)

Published in:

RARE METALS -BEIJING- ENGLISH EDITION ; 31 ; 183-188

Publication date:

2012-01-01

Size:

6 pages

ISSN:

1001-0521

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 669

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