Correlation between molecular secondary ion yield and cluster ion sputtering for samples with different stopping powers: Fid-Bau Portal

Correlation between molecular secondary ion yield and cluster ion sputtering for samples with different stopping powers

Heile, A. / Muhmann, C. / Lipinsky, D. / Arlinghaus, H. F.

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Correlation between molecular secondary ion yield and cluster ion sputtering for samples with different stopping powers

Heile, A. / Muhmann, C. / Lipinsky, D. / Arlinghaus, H. F.

Correlation between molecular secondary ion yield and cluster ion sputtering for samples with different stopping powers

Heile, A. / Muhmann, C. / Lipinsky, D. / Arlinghaus, H. F.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Correlation between molecular secondary ion yield and cluster ion sputtering for samples with different stopping powers

Contributors:

Heile, A. (author) / Muhmann, C. (author) / Lipinsky, D. (author) / Arlinghaus, H. F. (author)

Published in:

APPLIED SURFACE SCIENCE ; 258 ; 6993-6999

Publication date:

2012-01-01

Size:

7 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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