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    Characterization of delafossite-CuCrO2 thin films prepared by post-annealing using an atmospheric pressure plasma torch

    New search for: Chen, H. Y.
    New search for: Yang, W. J.
    New search for: Chang, K. P.

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    Characterization of delafossite-CuCrO2 thin films prepared by post-annealing using an atmospheric pressure plasma torch

    New search for: Chen, H. Y.
    New search for: Yang, W. J.
    New search for: Chang, K. P.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Characterization of delafossite-CuCrO2 thin films prepared by post-annealing using an atmospheric pressure plasma torch

    New search for: Chen, H. Y.
    New search for: Yang, W. J.
    New search for: Chang, K. P.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

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    Check availability in my library
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    Document information
    Title:

    Characterization of delafossite-CuCrO2 thin films prepared by post-annealing using an atmospheric pressure plasma torch

    Contributors:

    Chen, H. Y. (author) / Yang, W. J. (author) / Chang, K. P. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 258 ; 8775-8779

    Publication date:

    2012-01-01

    Size:

    5 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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