Effect of the nanoscratch resistance of indium nitride thin films in the etching duration: Fid-Bau Portal

Effect of the nanoscratch resistance of indium nitride thin films in the etching duration

Hsu, W. N. / Shih, T. S.

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Effect of the nanoscratch resistance of indium nitride thin films in the etching duration

Hsu, W. N. / Shih, T. S.

Effect of the nanoscratch resistance of indium nitride thin films in the etching duration

Hsu, W. N. / Shih, T. S.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Effect of the nanoscratch resistance of indium nitride thin films in the etching duration

Contributors:

Hsu, W. N. (author) / Shih, T. S. (author)

Published in:

APPLIED SURFACE SCIENCE ; 261 ; 610-615

Publication date:

2012-01-01

Size:

6 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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