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    Hardness of silicon nitride thin films characterised by nanoindentation and nanoscratch deconvolution methods

    New search for: Liu, S.
    New search for: Huang, H.
    New search for: Gu, Y.T.

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    Hardness of silicon nitride thin films characterised by nanoindentation and nanoscratch deconvolution methods

    New search for: Liu, S.
    New search for: Huang, H.
    New search for: Gu, Y.T.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Hardness of silicon nitride thin films characterised by nanoindentation and nanoscratch deconvolution methods

    New search for: Liu, S.
    New search for: Huang, H.
    New search for: Gu, Y.T.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Hardness of silicon nitride thin films characterised by nanoindentation and nanoscratch deconvolution methods

    Contributors:

    Liu, S. (author) / Huang, H. (author) / Gu, Y.T. (author)

    Published in:

    MATERIALS SCIENCE AND TECHNOLOGY -LONDON- ; 28 ; 1172-1176

    Publication date:

    2012-01-01

    Size:

    5 pages

    ISSN:

    0267-0836

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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