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Effect of annealing temperature on the copper nanoparticles deposited on the silicon nanoporous pillar array

Yang, X. H. / Zeng, F. G. / Li, X. J.

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Effect of annealing temperature on the copper nanoparticles deposited on the silicon nanoporous pillar array

Yang, X. H. / Zeng, F. G. / Li, X. J.

Effect of annealing temperature on the copper nanoparticles deposited on the silicon nanoporous pillar array

Yang, X. H. / Zeng, F. G. / Li, X. J.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Effect of annealing temperature on the copper nanoparticles deposited on the silicon nanoporous pillar array

Contributors:

Yang, X. H. (author) / Zeng, F. G. (author) / Li, X. J. (author)

Published in:

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 16 ; 10-14

Publication date:

2013-01-01

Size:

5 pages

ISSN:

1369-8001

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.38152

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