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CW-diode laser crystallization of sputtered amorphous silicon on glass, SiNx, and SiO2 intermediate layers
CW-diode laser crystallization of sputtered amorphous silicon on glass, SiNx, and SiO2 intermediate layers
CW-diode laser crystallization of sputtered amorphous silicon on glass, SiNx, and SiO2 intermediate layers
Schmidl, G. (author) / Andrä, G. (author) / Bergmann, J. (author) / Gawlik, A. (author) / Höger, I. (author) / Anders, S. (author) / Schmidl, F. (author) / Tympel, V. (author) / Falk, F. (author)
JOURNAL OF MATERIALS SCIENCE ; 48 ; 4177-4182
2013-01-01
6 pages
Article (Journal)
English
DDC:
620.11
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