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    Structural and electrical properties of sputtering power and gas pressure on Ti-dope In2O3 transparent conductive films by RF magnetron sputtering

    New search for: Chaoumead, A.
    New search for: Joo, B. H.
    New search for: Kwak, D. J.
    New search for: Sung, Y. M.

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    Structural and electrical properties of sputtering power and gas pressure on Ti-dope In2O3 transparent conductive films by RF magnetron sputtering

    New search for: Chaoumead, A.
    New search for: Joo, B. H.
    New search for: Kwak, D. J.
    New search for: Sung, Y. M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Structural and electrical properties of sputtering power and gas pressure on Ti-dope In2O3 transparent conductive films by RF magnetron sputtering

    New search for: Chaoumead, A.
    New search for: Joo, B. H.
    New search for: Kwak, D. J.
    New search for: Sung, Y. M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Structural and electrical properties of sputtering power and gas pressure on Ti-dope In2O3 transparent conductive films by RF magnetron sputtering

    Contributors:

    Chaoumead, A. (author) / Joo, B. H. (author) / Kwak, D. J. (author) / Sung, Y. M. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 275 ; 227-232

    Publication date:

    2013-01-01

    Size:

    6 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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