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    Facile Encapsulation of Oxide based Thin Film Transistors by Atomic Layer Deposition based on Ozone

    New search for: Fakhri, M.
    New search for: Babin, N.
    New search for: Behrendt, A.
    New search for: Jakob, T.
    New search for: Grrn, P.
    New search for: Riedl, T.

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    Facile Encapsulation of Oxide based Thin Film Transistors by Atomic Layer Deposition based on Ozone

    New search for: Fakhri, M.
    New search for: Babin, N.
    New search for: Behrendt, A.
    New search for: Jakob, T.
    New search for: Grrn, P.
    New search for: Riedl, T.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Facile Encapsulation of Oxide based Thin Film Transistors by Atomic Layer Deposition based on Ozone

    New search for: Fakhri, M.
    New search for: Babin, N.
    New search for: Behrendt, A.
    New search for: Jakob, T.
    New search for: Grrn, P.
    New search for: Riedl, T.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Facile Encapsulation of Oxide based Thin Film Transistors by Atomic Layer Deposition based on Ozone

    Contributors:

    Fakhri, M. (author) / Babin, N. (author) / Behrendt, A. (author) / Jakob, T. (author) / Grrn, P. (author) / Riedl, T. (author)

    Published in:

    ADVANCED MATERIALS -DEERFIELD BEACH THEN WEINHEIM- ; 25 ; 2821-2825

    Publication date:

    2013-01-01

    Size:

    5 pages

    ISSN:

    0935-9648

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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