Interfaces: Ultralow Contact Resistance at an Epitaxial Metal/Oxide Heterojunction Through Interstitial Site Doping (Adv. Mater. 29/2013): Fid-Bau Portal

Interfaces: Ultralow Contact Resistance at an Epitaxial Metal/Oxide Heterojunction Through Interstitial Site Doping (Adv. Mater. 29/2013)

Chambers, S. A. / Gu, M. / Sushko, P. V. / Yang, H. / Wang, C. / Browning, N. D.

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Interfaces: Ultralow Contact Resistance at an Epitaxial Metal/Oxide Heterojunction Through Interstitial Site Doping (Adv. Mater. 29/2013)

Chambers, S. A. / Gu, M. / Sushko, P. V. / Yang, H. / Wang, C. / Browning, N. D.

Interfaces: Ultralow Contact Resistance at an Epitaxial Metal/Oxide Heterojunction Through Interstitial Site Doping (Adv. Mater. 29/2013)

Chambers, S. A. / Gu, M. / Sushko, P. V. / Yang, H. / Wang, C. / Browning, N. D.

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Document information

Title:

Interfaces: Ultralow Contact Resistance at an Epitaxial Metal/Oxide Heterojunction Through Interstitial Site Doping (Adv. Mater. 29/2013)

Contributors:

Chambers, S. A. (author) / Gu, M. (author) / Sushko, P. V. (author) / Yang, H. (author) / Wang, C. (author) / Browning, N. D. (author)

Published in:

ADVANCED MATERIALS -DEERFIELD BEACH THEN WEINHEIM- ; 25 ; 3926-3926

Publication date:

2013-01-01

Size:

1 pages

ISSN:

0935-9648

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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