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    Investigation of oxygen plasma treatment on the device performance of solution-processed a-IGZO thin film transistors

    New search for: Pu, H.
    New search for: Zhou, Q.
    New search for: Yue, L.
    New search for: Zhang, Q.

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    Investigation of oxygen plasma treatment on the device performance of solution-processed a-IGZO thin film transistors

    New search for: Pu, H.
    New search for: Zhou, Q.
    New search for: Yue, L.
    New search for: Zhang, Q.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Investigation of oxygen plasma treatment on the device performance of solution-processed a-IGZO thin film transistors

    New search for: Pu, H.
    New search for: Zhou, Q.
    New search for: Yue, L.
    New search for: Zhang, Q.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

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    Check availability in my library
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    Document information
    Similar titles

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    Document information
    Title:

    Investigation of oxygen plasma treatment on the device performance of solution-processed a-IGZO thin film transistors

    Contributors:

    Pu, H. (author) / Zhou, Q. (author) / Yue, L. (author) / Zhang, Q. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 283 ; 722-726

    Publication date:

    2013-01-01

    Size:

    5 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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