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Investigation of oxygen plasma treatment on the device performance of solution-processed a-IGZO thin film transistors
Investigation of oxygen plasma treatment on the device performance of solution-processed a-IGZO thin film transistors
Investigation of oxygen plasma treatment on the device performance of solution-processed a-IGZO thin film transistors
APPLIED SURFACE SCIENCE ; 283 ; 722-726
01.01.2013
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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