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Epitaxial growth of germanium-rich silicon-germanium films on Si(001) substrate by reactive thermal chemical vapor deposition

Tao, K. / Hanna, J. i.

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Epitaxial growth of germanium-rich silicon-germanium films on Si(001) substrate by reactive thermal chemical vapor deposition

Tao, K. / Hanna, J. i.

Epitaxial growth of germanium-rich silicon-germanium films on Si(001) substrate by reactive thermal chemical vapor deposition

Tao, K. / Hanna, J. i.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Epitaxial growth of germanium-rich silicon-germanium films on Si(001) substrate by reactive thermal chemical vapor deposition

Contributors:

Tao, K. (author) / Hanna, J. i. (author)

Published in:

APPLIED SURFACE SCIENCE ; 282 ; 472-477

Publication date:

2013-01-01

Size:

6 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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