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Low temperature, high growth rate epitaxial silicon and silicon germanium alloy films

Todd, M. A. / Weeks, K. D.

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Low temperature, high growth rate epitaxial silicon and silicon germanium alloy films

Todd, M. A. / Weeks, K. D.

Low temperature, high growth rate epitaxial silicon and silicon germanium alloy films

Todd, M. A. / Weeks, K. D.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Low temperature, high growth rate epitaxial silicon and silicon germanium alloy films

Contributors:

Todd, M. A. (author) / Weeks, K. D. (author)

Published in:

APPLIED SURFACE SCIENCE ; 224 ; 41-45

Publication date:

2004-01-01

Size:

5 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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