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Directed self-assembly of block copolymers for next generation nanolithography

Jeong, S. J. / Kim, J. Y. / Kim, B. H. / Moon, H. S. / Kim, S. O.

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Directed self-assembly of block copolymers for next generation nanolithography

Jeong, S. J. / Kim, J. Y. / Kim, B. H. / Moon, H. S. / Kim, S. O.

Directed self-assembly of block copolymers for next generation nanolithography

Jeong, S. J. / Kim, J. Y. / Kim, B. H. / Moon, H. S. / Kim, S. O.

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Check availability in my library

Order at Subito €

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Document information

Title:

Directed self-assembly of block copolymers for next generation nanolithography

Contributors:

Jeong, S. J. (author) / Kim, J. Y. (author) / Kim, B. H. (author) / Moon, H. S. (author) / Kim, S. O. (author)

Published in:

MATERIALS TODAY -OXFORD THEN KIDLINGTON- ; 16 ; 468-476

Publication date:

2013-01-01

Size:

9 pages

ISSN:

1369-7021

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11299

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