A platform for research: civil engineering, architecture and urbanism
A silicon-on-insulator metal-semiconductor field-effect transistor with an L-shaped buried oxide for high output-power density
A silicon-on-insulator metal-semiconductor field-effect transistor with an L-shaped buried oxide for high output-power density
A silicon-on-insulator metal-semiconductor field-effect transistor with an L-shaped buried oxide for high output-power density
Ramezani, Z. (author) / Orouji, A. A. (author)
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 19 ; 124-129
2014-01-01
6 pages
Article (Journal)
English
DDC:
621.38152
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
British Library Online Contents | 2002
|Thin film diamond metal-insulator field effect transistor for high temperature applications
British Library Online Contents | 1997
|British Library Online Contents | 2013
|Silicon-on-insulator technology for high temperature metal oxide semiconductor devices and circuits
British Library Online Contents | 1995
|