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Well-controlled wet etching of ZnO films using hydrogen peroxide solution

Wang, Y. / Wu, T. / Chen, M. / Su, L. / Zhang, Q. / Yuan, L. / Zhu, Y. / Tang, Z.

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Well-controlled wet etching of ZnO films using hydrogen peroxide solution

Wang, Y. / Wu, T. / Chen, M. / Su, L. / Zhang, Q. / Yuan, L. / Zhu, Y. / Tang, Z.

Well-controlled wet etching of ZnO films using hydrogen peroxide solution

Wang, Y. / Wu, T. / Chen, M. / Su, L. / Zhang, Q. / Yuan, L. / Zhu, Y. / Tang, Z.

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Well-controlled wet etching of ZnO films using hydrogen peroxide solution

Contributors:

Wang, Y. (author) / Wu, T. (author) / Chen, M. (author) / Su, L. (author) / Zhang, Q. (author) / Yuan, L. (author) / Zhu, Y. (author) / Tang, Z. (author)

Published in:

APPLIED SURFACE SCIENCE ; 292 ; 34-38

Publication date:

2014-01-01

Size:

5 pages

ISSN:

Type of media:

Article (Journal)

Type of material:

Print

Language:

English

Classification:

© Metadata Copyright the British Library Board and other contributors. All rights reserved.

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