High temperature thermal stability of the HfO"2/Ge (100) interface as a function of surface preparation studied by synchrotron radiation core level photoemission: Fid-Bau Portal

High temperature thermal stability of the HfO"2/Ge (100) interface as a function of surface preparation studied by synchrotron radiation core level photoemission

Chellappan, R. K. / Gajula, D. R. / McNeill, D. / Hughes, G.

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High temperature thermal stability of the HfO"2/Ge (100) interface as a function of surface preparation studied by synchrotron radiation core level photoemission

Chellappan, R. K. / Gajula, D. R. / McNeill, D. / Hughes, G.

High temperature thermal stability of the HfO"2/Ge (100) interface as a function of surface preparation studied by synchrotron radiation core level photoemission

Chellappan, R. K. / Gajula, D. R. / McNeill, D. / Hughes, G.

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Check availability in my library

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Document information

Title:

High temperature thermal stability of the HfO"2/Ge (100) interface as a function of surface preparation studied by synchrotron radiation core level photoemission

Contributors:

Chellappan, R. K. (author) / Gajula, D. R. (author) / McNeill, D. (author) / Hughes, G. (author)

Published in:

APPLIED SURFACE SCIENCE ; 292 ; 345-349

Publication date:

2014-01-01

Size:

5 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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