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High temperature thermal stability of the HfO"2/Ge (100) interface as a function of surface preparation studied by synchrotron radiation core level photoemission
High temperature thermal stability of the HfO"2/Ge (100) interface as a function of surface preparation studied by synchrotron radiation core level photoemission
High temperature thermal stability of the HfO"2/Ge (100) interface as a function of surface preparation studied by synchrotron radiation core level photoemission
Chellappan, R. K. (Autor:in) / Gajula, D. R. (Autor:in) / McNeill, D. (Autor:in) / Hughes, G. (Autor:in)
APPLIED SURFACE SCIENCE ; 292 ; 345-349
01.01.2014
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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