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    Nitrogen doping for adhesion improvement of DLC film deposited on Si substrate by Filtered Cathodic Vacuum Arc (FCVA) technique

    New search for: Bootkul, D.
    New search for: Supsermpol, B.
    New search for: Saenphinit, N.
    New search for: Aramwit, C.
    New search for: Intarasiri, S.

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    Nitrogen doping for adhesion improvement of DLC film deposited on Si substrate by Filtered Cathodic Vacuum Arc (FCVA) technique

    New search for: Bootkul, D.
    New search for: Supsermpol, B.
    New search for: Saenphinit, N.
    New search for: Aramwit, C.
    New search for: Intarasiri, S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Nitrogen doping for adhesion improvement of DLC film deposited on Si substrate by Filtered Cathodic Vacuum Arc (FCVA) technique

    New search for: Bootkul, D.
    New search for: Supsermpol, B.
    New search for: Saenphinit, N.
    New search for: Aramwit, C.
    New search for: Intarasiri, S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

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    Document information
    Title:

    Nitrogen doping for adhesion improvement of DLC film deposited on Si substrate by Filtered Cathodic Vacuum Arc (FCVA) technique

    Contributors:

    Bootkul, D. (author) / Supsermpol, B. (author) / Saenphinit, N. (author) / Aramwit, C. (author) / Intarasiri, S. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 310 ; 284-292

    Publication date:

    2014-01-01

    Size:

    9 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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