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    Effect of Different Oxygen Flow Rate on Physical Properties of ITO Thin Films Deposited by Ion-Assistant Electron Beam Evaporation

    New search for: Qiu, Y.
    New search for: Meng, D.Y.
    New search for: Chen, Y.F.
    New search for: Zu, C.K.
    New search for: Pan, W.
    New search for: Gong, J.

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    Effect of Different Oxygen Flow Rate on Physical Properties of ITO Thin Films Deposited by Ion-Assistant Electron Beam Evaporation

    New search for: Qiu, Y.
    New search for: Meng, D.Y.
    New search for: Chen, Y.F.
    New search for: Zu, C.K.
    New search for: Pan, W.
    New search for: Gong, J.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Effect of Different Oxygen Flow Rate on Physical Properties of ITO Thin Films Deposited by Ion-Assistant Electron Beam Evaporation

    New search for: Qiu, Y.
    New search for: Meng, D.Y.
    New search for: Chen, Y.F.
    New search for: Zu, C.K.
    New search for: Pan, W.
    New search for: Gong, J.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

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    Document information
    Title:

    Effect of Different Oxygen Flow Rate on Physical Properties of ITO Thin Films Deposited by Ion-Assistant Electron Beam Evaporation

    Contributors:

    Qiu, Y. (author) / Meng, D.Y. (author) / Chen, Y.F. (author) / Zu, C.K. (author) / Pan, W. / Gong, J.

    Published in:

    High-Performance Ceramics VIII ; 1004-1008

    KEY ENGINEERING MATERIALS ; 602/603

    Publication date:

    2014-01-01

    Size:

    5 pages

    ISSN:

    1013-9826

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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