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    The conducting tin oxide thin films deposited via atomic layer deposition using Tetrakis-dimethylamino tin and peroxide for transparent flexible electronics

    New search for: Choi, D. w.
    New search for: Maeng, W. J.
    New search for: Park, J. S.

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    The conducting tin oxide thin films deposited via atomic layer deposition using Tetrakis-dimethylamino tin and peroxide for transparent flexible electronics

    New search for: Choi, D. w.
    New search for: Maeng, W. J.
    New search for: Park, J. S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    The conducting tin oxide thin films deposited via atomic layer deposition using Tetrakis-dimethylamino tin and peroxide for transparent flexible electronics

    New search for: Choi, D. w.
    New search for: Maeng, W. J.
    New search for: Park, J. S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

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    Check availability in my library
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    Document information
    Similar titles

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    Document information
    Title:

    The conducting tin oxide thin films deposited via atomic layer deposition using Tetrakis-dimethylamino tin and peroxide for transparent flexible electronics

    Contributors:

    Choi, D. w. (author) / Maeng, W. J. (author) / Park, J. S. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 313 ; 585-590

    Publication date:

    2014-01-01

    Size:

    6 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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