Fachinformationsdienst BAUdigital

A platform for research: civil engineering, architecture and urbanism

    Automated Tool for Measuring Nanotopography of 300 mm Wafers at early Stages of Wafer Production

    New search for: Troger, B.
    New search for: Muhlig, A.
    New search for: Fries, T.
    New search for: Bauer, S.
    New search for: Wihr, H.
    New search for: Riedel, F.
    New search for: Lewke, D.
    New search for: Schellenberger, M.
    New search for: Schmitt, R.
    New search for: Bosse, H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Automated Tool for Measuring Nanotopography of 300 mm Wafers at early Stages of Wafer Production

    New search for: Troger, B.
    New search for: Muhlig, A.
    New search for: Fries, T.
    New search for: Bauer, S.
    New search for: Wihr, H.
    New search for: Riedel, F.
    New search for: Lewke, D.
    New search for: Schellenberger, M.
    New search for: Schmitt, R.
    New search for: Bosse, H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Automated Tool for Measuring Nanotopography of 300 mm Wafers at early Stages of Wafer Production

    New search for: Troger, B.
    New search for: Muhlig, A.
    New search for: Fries, T.
    New search for: Bauer, S.
    New search for: Wihr, H.
    New search for: Riedel, F.
    New search for: Lewke, D.
    New search for: Schellenberger, M.
    New search for: Schmitt, R.
    New search for: Bosse, H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Automated Tool for Measuring Nanotopography of 300 mm Wafers at early Stages of Wafer Production

    Contributors:

    Troger, B. (author) / Muhlig, A. (author) / Fries, T. (author) / Bauer, S. (author) / Wihr, H. (author) / Riedel, F. (author) / Lewke, D. (author) / Schellenberger, M. (author) / Schmitt, R. / Bosse, H.

    Published in:

    Measurement Technology and Intelligent Instruments XI Metrology - Master Global Challenges ; 87-93

    KEY ENGINEERING MATERIALS ; 613

    Publication date:

    2014-01-01

    Size:

    7 pages

    ISSN:

    1013-9826

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

    Similar titles

    Impact of filtering on nanotopography measurement of 300mm silicon wafers

    Riedel, F. / Gerber, H. A. / Wagner, P. | British Library Online Contents | 2002

    On the impact of nanotopography of silicon wafers on post-CMP oxide layers

    Schmolke, R. / Deters, R. / Thieme, P. et al. | British Library Online Contents | 2002

    Tubes with Controllable Internal Nanotopography

    Gadegaard, N. / Dalby, M. J. / Riehle, M. O. et al. | British Library Online Contents | 2004

    Modulating the Nanotopography of Apatites

    Bohner, M. | British Library Online Contents | 2004

    Nanotopography Issues in Shallow Trench Isolation CMP

    Boning, D. / Lee, B. | British Library Online Contents | 2002

    Back to top