A platform for research: civil engineering, architecture and urbanism
A platform for research: civil engineering, architecture and urbanism
On the impact of nanotopography of silicon wafers on post-CMP oxide layers
On the impact of nanotopography of silicon wafers on post-CMP oxide layers
On the impact of nanotopography of silicon wafers on post-CMP oxide layers
Schmolke, R. (author) / Deters, R. (author) / Thieme, P. (author) / Pech, R. (author) / Schwenk, H. (author) / Diakourakis, G. (author)
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 5 ; 413-418
2002-01-01
6 pages
Article (Journal)
English
DDC:
621.38152
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Impact of filtering on nanotopography measurement of 300mm silicon wafers
| British Library Online Contents | 2002
Automated Tool for Measuring Nanotopography of 300 mm Wafers at early Stages of Wafer Production
| British Library Online Contents | 2014
Tubes with Controllable Internal Nanotopography
| British Library Online Contents | 2004
Modulating the Nanotopography of Apatites
| British Library Online Contents | 2004
Ellipsometric analysis of ultrathin oxide layers on SIMOX wafers
| British Library Online Contents | 2000