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Organic Field-Effect Transistors: The Origin of Excellent Gate-Bias Stress Stability in Organic Field-Effect Transistors Employing Fluorinated-Polymer Gate Dielectrics (Adv. Mater. 42/2014)
Organic Field-Effect Transistors: The Origin of Excellent Gate-Bias Stress Stability in Organic Field-Effect Transistors Employing Fluorinated-Polymer Gate Dielectrics (Adv. Mater. 42/2014)
Organic Field-Effect Transistors: The Origin of Excellent Gate-Bias Stress Stability in Organic Field-Effect Transistors Employing Fluorinated-Polymer Gate Dielectrics (Adv. Mater. 42/2014)
Kim, J. (author) / Jang, J. (author) / Kim, K. (author) / Kim, H. (author) / Kim, S. H. (author) / Park, C. E. (author)
ADVANCED MATERIALS -DEERFIELD BEACH THEN WEINHEIM- ; 26 ; 7280-7280
2014-01-01
1 pages
Article (Journal)
English
DDC:
620.11
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