Effect of annealing temperature on properties of ZnO:Al thin films prepared by pulsed DC reactive magnetron sputtering: Fid-Bau Portal

Effect of annealing temperature on properties of ZnO:Al thin films prepared by pulsed DC reactive magnetron sputtering

Liu, C. / Xu, Z. / Zhang, Y. / Fu, J. / Zang, S. / Zuo, Y.

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Effect of annealing temperature on properties of ZnO:Al thin films prepared by pulsed DC reactive magnetron sputtering

Liu, C. / Xu, Z. / Zhang, Y. / Fu, J. / Zang, S. / Zuo, Y.

Effect of annealing temperature on properties of ZnO:Al thin films prepared by pulsed DC reactive magnetron sputtering

Liu, C. / Xu, Z. / Zhang, Y. / Fu, J. / Zang, S. / Zuo, Y.

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Effect of annealing temperature on properties of ZnO:Al thin films prepared by pulsed DC reactive magnetron sputtering

Contributors:

Liu, C. (author) / Xu, Z. (author) / Zhang, Y. (author) / Fu, J. (author) / Zang, S. (author) / Zuo, Y. (author)

Published in:

MATERIALS LETTERS ; 139 ; 279-283

Publication date:

2015-01-01

Size:

5 pages

ISSN:

0167-577X

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.1105 / 530

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