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Microcontact-Printing-Assisted Access of Graphitic Carbon Nitride Films with Favorable Textures toward Photoelectrochemical Application

Liu, J. / Wang, H. / Chen, Z. P. / Moehwald, H. / Fiechter, S. / van de Krol, R. / Wen, L. / Jiang, L. / Antonietti, M.

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Microcontact-Printing-Assisted Access of Graphitic Carbon Nitride Films with Favorable Textures toward Photoelectrochemical Application

Liu, J. / Wang, H. / Chen, Z. P. / Moehwald, H. / Fiechter, S. / van de Krol, R. / Wen, L. / Jiang, L. / Antonietti, M.

Microcontact-Printing-Assisted Access of Graphitic Carbon Nitride Films with Favorable Textures toward Photoelectrochemical Application

Liu, J. / Wang, H. / Chen, Z. P. / Moehwald, H. / Fiechter, S. / van de Krol, R. / Wen, L. / Jiang, L. / Antonietti, M.

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Title:

Microcontact-Printing-Assisted Access of Graphitic Carbon Nitride Films with Favorable Textures toward Photoelectrochemical Application

Contributors:

Liu, J. (author) / Wang, H. (author) / Chen, Z. P. (author) / Moehwald, H. (author) / Fiechter, S. (author) / van de Krol, R. (author) / Wen, L. (author) / Jiang, L. (author) / Antonietti, M. (author)

Published in:

ADVANCED MATERIALS -DEERFIELD BEACH THEN WEINHEIM- ; 27 ; 712-718

Publication date:

2015-01-01

Size:

7 pages

ISSN:

0935-9648

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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