A platform for research: civil engineering, architecture and urbanism
Surface roughening of ground fused silica processed by atmospheric inductively coupled plasma
Surface roughening of ground fused silica processed by atmospheric inductively coupled plasma
Surface roughening of ground fused silica processed by atmospheric inductively coupled plasma
APPLIED SURFACE SCIENCE ; 341 ; 142-148
2015-01-01
7 pages
Article (Journal)
English
DDC:
621.35
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Optimum inductively coupled plasma etching of fused silica to remove subsurface damage layer
British Library Online Contents | 2015
|Optimum inductively coupled plasma etching of fused silica to remove subsurface damage layer
British Library Online Contents | 2015
|Optimum inductively coupled plasma etching of fused silica to remove subsurface damage layer
British Library Online Contents | 2015
|British Library Online Contents | 2017
|