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Optimum inductively coupled plasma etching of fused silica to remove subsurface damage layer

Jiang, X. / Liu, Y. / Liu, Z. / Qiu, K. / Xu, X. / Hong, Y. / Fu, S.

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Optimum inductively coupled plasma etching of fused silica to remove subsurface damage layer

Jiang, X. / Liu, Y. / Liu, Z. / Qiu, K. / Xu, X. / Hong, Y. / Fu, S.

Optimum inductively coupled plasma etching of fused silica to remove subsurface damage layer

Jiang, X. / Liu, Y. / Liu, Z. / Qiu, K. / Xu, X. / Hong, Y. / Fu, S.

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Title:

Optimum inductively coupled plasma etching of fused silica to remove subsurface damage layer

Contributors:

Jiang, X. (author) / Liu, Y. (author) / Liu, Z. (author) / Qiu, K. (author) / Xu, X. (author) / Hong, Y. (author) / Fu, S. (author)

Published in:

APPLIED SURFACE SCIENCE ; 355 ; 1180-1185

Publication date:

2015-01-01

Size:

6 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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Surface roughening of ground fused silica processed by atmospheric inductively coupled plasma

Xin, Q. / Li, N. / Wang, J. et al. | British Library Online Contents | 2015

Black germanium produced by inductively coupled plasma etching

Schicho, S. / Jaouad, A. / Sellmer, C. et al. | British Library Online Contents | 2013