Effects of H2 annealing on polycrystalline copper substrates for graphene growth during low pressure chemical vapor deposition: Fid-Bau Portal

Effects of H2 annealing on polycrystalline copper substrates for graphene growth during low pressure chemical vapor deposition

Liu, J. / Adusumilli, S. P. / Condoluci, J. J. / Rastogi, A. C. / Bernier, W. E. / Jones, W. E.

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Effects of H2 annealing on polycrystalline copper substrates for graphene growth during low pressure chemical vapor deposition

Liu, J. / Adusumilli, S. P. / Condoluci, J. J. / Rastogi, A. C. / Bernier, W. E. / Jones, W. E.

Effects of H2 annealing on polycrystalline copper substrates for graphene growth during low pressure chemical vapor deposition

Liu, J. / Adusumilli, S. P. / Condoluci, J. J. / Rastogi, A. C. / Bernier, W. E. / Jones, W. E.

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Check availability in my library

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Document information

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Document information

Title:

Effects of H2 annealing on polycrystalline copper substrates for graphene growth during low pressure chemical vapor deposition

Contributors:

Liu, J. (author) / Adusumilli, S. P. (author) / Condoluci, J. J. (author) / Rastogi, A. C. (author) / Bernier, W. E. (author) / Jones, W. E. (author)

Published in:

MATERIALS LETTERS ; 153 ; 132-135

Publication date:

2015-01-01

Size:

4 pages

ISSN:

0167-577X

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.1105 / 530

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