Preparation of (001) preferentially oriented titanium thin films by ion-beam sputtering deposition on thermal silicon dioxide: Fid-Bau Portal

Preparation of (001) preferentially oriented titanium thin films by ion-beam sputtering deposition on thermal silicon dioxide

Gablech, I. / Svatoš, V. c. / Caha, O. e. / Hrabovský, M. / Prášek, J. / Hubálek, J. r. / Šikola, T.

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Preparation of (001) preferentially oriented titanium thin films by ion-beam sputtering deposition on thermal silicon dioxide

Gablech, I. / Svatoš, V. c. / Caha, O. e. / Hrabovský, M. / Prášek, J. / Hubálek, J. r. / Šikola, T.

Preparation of (001) preferentially oriented titanium thin films by ion-beam sputtering deposition on thermal silicon dioxide

Gablech, I. / Svatoš, V. c. / Caha, O. e. / Hrabovský, M. / Prášek, J. / Hubálek, J. r. / Šikola, T.

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Title:

Preparation of (001) preferentially oriented titanium thin films by ion-beam sputtering deposition on thermal silicon dioxide

Contributors:

Gablech, I. (author) / Svatoš, V. c. (author) / Caha, O. e. (author) / Hrabovský, M. (author) / Prášek, J. (author) / Hubálek, J. r. (author) / Šikola, T. (author)

Published in:

JOURNAL OF MATERIALS SCIENCE ; 51 ; 3329-3336

Publication date:

2016-01-01

Size:

8 pages

ISSN:

0022-2461

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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