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    Atomic oxygen treatment effects on magnetron sputtered Zr–Ti binary films

    New search for: Wang, W.
    New search for: Li, Z.
    New search for: Zhang, Z.
    New search for: Dong, S.
    New search for: Liu, Y.

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    Atomic oxygen treatment effects on magnetron sputtered Zr–Ti binary films

    New search for: Wang, W.
    New search for: Li, Z.
    New search for: Zhang, Z.
    New search for: Dong, S.
    New search for: Liu, Y.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Atomic oxygen treatment effects on magnetron sputtered Zr–Ti binary films

    New search for: Wang, W.
    New search for: Li, Z.
    New search for: Zhang, Z.
    New search for: Dong, S.
    New search for: Liu, Y.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Atomic oxygen treatment effects on magnetron sputtered Zr–Ti binary films

    Contributors:

    Wang, W. (author) / Li, Z. (author) / Zhang, Z. (author) / Dong, S. (author) / Liu, Y. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 324 ; 669-676

    Publication date:

    2015-01-01

    Size:

    8 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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