Ultra-low-κ HFPDB-based periodic mesoporous organosilica film with high mechanical strength for interlayer dielectric: Fid-Bau Portal

Ultra-low-κ HFPDB-based periodic mesoporous organosilica film with high mechanical strength for interlayer dielectric

Zhang, J. / Zhang, G. / Gao, Y. / Sun, R. / Wong, C. P.

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Ultra-low-κ HFPDB-based periodic mesoporous organosilica film with high mechanical strength for interlayer dielectric

Zhang, J. / Zhang, G. / Gao, Y. / Sun, R. / Wong, C. P.

Ultra-low-κ HFPDB-based periodic mesoporous organosilica film with high mechanical strength for interlayer dielectric

Zhang, J. / Zhang, G. / Gao, Y. / Sun, R. / Wong, C. P.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Ultra-low-κ HFPDB-based periodic mesoporous organosilica film with high mechanical strength for interlayer dielectric

Contributors:

Zhang, J. (author) / Zhang, G. (author) / Gao, Y. (author) / Sun, R. (author) / Wong, C. P. (author)

Published in:

JOURNAL OF MATERIALS SCIENCE ; 51 ; 7966-7976

Publication date:

2016-01-01

Size:

11 pages

ISSN:

0022-2461

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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