A platform for research: civil engineering, architecture and urbanism
Physical and electrical characteristics of NiFe thin films using ultrasonic assisted pulse electrodeposition
Physical and electrical characteristics of NiFe thin films using ultrasonic assisted pulse electrodeposition
Physical and electrical characteristics of NiFe thin films using ultrasonic assisted pulse electrodeposition
Asa Deepthi, K. (author) / Balachandran, R. (author) / Ong, B. H. (author) / Tan, K. B. (author) / Wong, H. Y. (author) / Yow, H. K. (author) / Srimala, S. (author)
APPLIED SURFACE SCIENCE ; 360 ; 519-524
2016-01-01
6 pages
Article (Journal)
English
DDC:
621.35
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Technology of Ultrasonic and Pulse Electrodeposition for ZnSe Thin Films
British Library Online Contents | 2011
|Pulsed electrodeposition of Cu2ZnSnS4 thin films: Effect of pulse potentials
British Library Online Contents | 2015
Solar cells from thin films prepared by periodic pulse electrodeposition
British Library Online Contents | 1996
|Oxidation of NiFe(20 wt.%) thin films
British Library Online Contents | 2001
|British Library Online Contents | 2019
|