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    Thermal stability of hydrogenated diamond films in nitrogen ambience studied by reflection electron energy spectroscopy and X-ray photoelectron spectroscopy

    New search for: Ren, B.
    New search for: Huang, J.
    New search for: Yu, H.
    New search for: Yang, W.
    New search for: Wang, L.
    New search for: Pan, Z.

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    Thermal stability of hydrogenated diamond films in nitrogen ambience studied by reflection electron energy spectroscopy and X-ray photoelectron spectroscopy

    New search for: Ren, B.
    New search for: Huang, J.
    New search for: Yu, H.
    New search for: Yang, W.
    New search for: Wang, L.
    New search for: Pan, Z.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Thermal stability of hydrogenated diamond films in nitrogen ambience studied by reflection electron energy spectroscopy and X-ray photoelectron spectroscopy

    New search for: Ren, B.
    New search for: Huang, J.
    New search for: Yu, H.
    New search for: Yang, W.
    New search for: Wang, L.
    New search for: Pan, Z.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Thermal stability of hydrogenated diamond films in nitrogen ambience studied by reflection electron energy spectroscopy and X-ray photoelectron spectroscopy

    Contributors:

    Ren, B. (author) / Huang, J. (author) / Yu, H. (author) / Yang, W. (author) / Wang, L. (author) / Pan, Z. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 388 ; 565-570

    Publication date:

    2016-01-01

    Size:

    6 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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