Interface engineering of titanium oxide protected a-Si:H/a-Si:H photoelectrodes for light induced water splitting: Fid-Bau Portal

Interface engineering of titanium oxide protected a-Si:H/a-Si:H photoelectrodes for light induced water splitting

Ziegler, J. r. / Yang, F. / Wagner, S. / Kaiser, B. / Jaegermann, W. / Urbain, F. l. / Becker, J. P. / Smirnov, V. / Finger, F.

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Interface engineering of titanium oxide protected a-Si:H/a-Si:H photoelectrodes for light induced water splitting

Ziegler, J. r. / Yang, F. / Wagner, S. / Kaiser, B. / Jaegermann, W. / Urbain, F. l. / Becker, J. P. / Smirnov, V. / Finger, F.

Interface engineering of titanium oxide protected a-Si:H/a-Si:H photoelectrodes for light induced water splitting

Ziegler, J. r. / Yang, F. / Wagner, S. / Kaiser, B. / Jaegermann, W. / Urbain, F. l. / Becker, J. P. / Smirnov, V. / Finger, F.

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Check availability in my library

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Document information

Title:

Interface engineering of titanium oxide protected a-Si:H/a-Si:H photoelectrodes for light induced water splitting

Contributors:

Ziegler, J. r. (author) / Yang, F. (author) / Wagner, S. (author) / Kaiser, B. (author) / Jaegermann, W. (author) / Urbain, F. l. (author) / Becker, J. P. (author) / Smirnov, V. (author) / Finger, F. (author)

Published in:

APPLIED SURFACE SCIENCE ; 389 ; 73-79

Publication date:

2016-01-01

Size:

7 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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