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    MOCVD growth and characterization of vanadium dioxide films

    New search for: Yakovkina, L. V.
    New search for: Mutilin, S. V.
    New search for: Prinz, V. Y.
    New search for: Smirnova, T. P.
    New search for: Shayapov, V. R.
    New search for: Korol’kov, I. V.
    New search for: Maksimovsky, E. A.
    New search for: Volchok, N. D.

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    MOCVD growth and characterization of vanadium dioxide films

    New search for: Yakovkina, L. V.
    New search for: Mutilin, S. V.
    New search for: Prinz, V. Y.
    New search for: Smirnova, T. P.
    New search for: Shayapov, V. R.
    New search for: Korol’kov, I. V.
    New search for: Maksimovsky, E. A.
    New search for: Volchok, N. D.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    MOCVD growth and characterization of vanadium dioxide films

    New search for: Yakovkina, L. V.
    New search for: Mutilin, S. V.
    New search for: Prinz, V. Y.
    New search for: Smirnova, T. P.
    New search for: Shayapov, V. R.
    New search for: Korol’kov, I. V.
    New search for: Maksimovsky, E. A.
    New search for: Volchok, N. D.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
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    Document information
    Title:

    MOCVD growth and characterization of vanadium dioxide films

    Contributors:

    Yakovkina, L. V. (author) / Mutilin, S. V. (author) / Prinz, V. Y. (author) / Smirnova, T. P. (author) / Shayapov, V. R. (author) / Korol’kov, I. V. (author) / Maksimovsky, E. A. (author) / Volchok, N. D. (author)

    Published in:

    JOURNAL OF MATERIALS SCIENCE ; 52 ; 4061-4069

    Publication date:

    2017-01-01

    Size:

    9 pages

    ISSN:

    0022-2461

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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