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    a-SiOx:H passivation layers for Cz-Si wafer deposited by hot wire chemical vapor deposition

    New search for: He, Yuping
    New search for: Huang, Haibin
    New search for: Zhou, Lang
    New search for: Yue, Zhihao
    New search for: Yuan, Jiren
    New search for: Zhou, Naigen
    New search for: Gao, Chao

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    a-SiOx:H passivation layers for Cz-Si wafer deposited by hot wire chemical vapor deposition

    New search for: He, Yuping
    New search for: Huang, Haibin
    New search for: Zhou, Lang
    New search for: Yue, Zhihao
    New search for: Yuan, Jiren
    New search for: Zhou, Naigen
    New search for: Gao, Chao

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    a-SiOx:H passivation layers for Cz-Si wafer deposited by hot wire chemical vapor deposition

    New search for: He, Yuping
    New search for: Huang, Haibin
    New search for: Zhou, Lang
    New search for: Yue, Zhihao
    New search for: Yuan, Jiren
    New search for: Zhou, Naigen
    New search for: Gao, Chao

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
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    Document information
    Title:

    a-SiOx:H passivation layers for Cz-Si wafer deposited by hot wire chemical vapor deposition

    Contributors:

    He, Yuping (author) / Huang, Haibin (author) / Zhou, Lang (author) / Yue, Zhihao (author) / Yuan, Jiren (author) / Zhou, Naigen (author) / Gao, Chao (author)

    Published in:

    Materials science in semiconductor processing ; 61 ; 1-4

    Publication date:

    2017-01-01

    Size:

    4 pages

    ISSN:

    1369-8001

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.38152

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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