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    Tuning of the microstructure, mechanical and tribological properties of a-C:H films by bias voltage of high frequency unipolar pulse

    New search for: Wang, Jia
    New search for: Cao, Zhongyue
    New search for: Pan, Fuping
    New search for: Wang, Fuguo
    New search for: Liang, Aimin
    New search for: Zhang, Junyan

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    Tuning of the microstructure, mechanical and tribological properties of a-C:H films by bias voltage of high frequency unipolar pulse

    New search for: Wang, Jia
    New search for: Cao, Zhongyue
    New search for: Pan, Fuping
    New search for: Wang, Fuguo
    New search for: Liang, Aimin
    New search for: Zhang, Junyan

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Tuning of the microstructure, mechanical and tribological properties of a-C:H films by bias voltage of high frequency unipolar pulse

    New search for: Wang, Jia
    New search for: Cao, Zhongyue
    New search for: Pan, Fuping
    New search for: Wang, Fuguo
    New search for: Liang, Aimin
    New search for: Zhang, Junyan

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Tuning of the microstructure, mechanical and tribological properties of a-C:H films by bias voltage of high frequency unipolar pulse

    Contributors:

    Wang, Jia (author) / Cao, Zhongyue (author) / Pan, Fuping (author) / Wang, Fuguo (author) / Liang, Aimin (author) / Zhang, Junyan (author)

    Published in:

    Applied surface science ; 356 ; 695-700

    Publication date:

    2015-01-01

    Size:

    6 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.44

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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