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    193nm Excimer laser processing of Si/Ge/Si(100) micropatterns

    New search for: Gontad, F.
    New search for: Conde, J.C.
    New search for: Chiussi, S.
    New search for: Serra, C.
    New search for: González, P.

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    193nm Excimer laser processing of Si/Ge/Si(100) micropatterns

    New search for: Gontad, F.
    New search for: Conde, J.C.
    New search for: Chiussi, S.
    New search for: Serra, C.
    New search for: González, P.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    193nm Excimer laser processing of Si/Ge/Si(100) micropatterns

    New search for: Gontad, F.
    New search for: Conde, J.C.
    New search for: Chiussi, S.
    New search for: Serra, C.
    New search for: González, P.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    193nm Excimer laser processing of Si/Ge/Si(100) micropatterns

    Contributors:

    Gontad, F. (author) / Conde, J.C. (author) / Chiussi, S. (author) / Serra, C. (author) / González, P. (author)

    Published in:

    Applied surface science ; 362 ; 217-220

    Publication date:

    2016-01-01

    Size:

    4 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.44

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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