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In-situ growth of HfO2 on clean 2H-MoS2 surface: Growth mode, interface reactions and energy band alignment
In-situ growth of HfO2 on clean 2H-MoS2 surface: Growth mode, interface reactions and energy band alignment
In-situ growth of HfO2 on clean 2H-MoS2 surface: Growth mode, interface reactions and energy band alignment
Chen, Chang Pang (author) / Ong, Bin Leong (author) / Ong, Sheau Wei (author) / Ong, Weijie (author) / Tan, Hui Ru (author) / Chai, Jian Wei (author) / Zhang, Zheng (author) / Wang, Shi Jie (author) / Pan, Ji Sheng (author) / Harrison, Leslie John (author)
Applied surface science ; 420 ; 523-534
2017-01-01
12 pages
Article (Journal)
English
DDC:
620.44
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