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    Characterization of deep defects in boron-doped CVD diamond films using transient photocapacitance method

    New search for: Maida, Osamu
    New search for: Hori, Takanori
    New search for: Kodama, Taishi
    New search for: Ito, Toshimichi

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    Characterization of deep defects in boron-doped CVD diamond films using transient photocapacitance method

    New search for: Maida, Osamu
    New search for: Hori, Takanori
    New search for: Kodama, Taishi
    New search for: Ito, Toshimichi

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Characterization of deep defects in boron-doped CVD diamond films using transient photocapacitance method

    New search for: Maida, Osamu
    New search for: Hori, Takanori
    New search for: Kodama, Taishi
    New search for: Ito, Toshimichi

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Characterization of deep defects in boron-doped CVD diamond films using transient photocapacitance method

    Contributors:

    Maida, Osamu (author) / Hori, Takanori (author) / Kodama, Taishi (author) / Ito, Toshimichi (author)

    Published in:

    Materials science in semiconductor processing ; 70 ; 203-206

    Publication date:

    2017-01-01

    Size:

    4 pages

    ISSN:

    1369-8001

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.38152

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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