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Interaction influence of S/D GeSi lattice mismatch and stress gradient of CESL on nano-scaled strained nMOSFETs
Interaction influence of S/D GeSi lattice mismatch and stress gradient of CESL on nano-scaled strained nMOSFETs
Interaction influence of S/D GeSi lattice mismatch and stress gradient of CESL on nano-scaled strained nMOSFETs
Lee, Chang-Chun (author) / Kuo, Yen-Ting (author) / Liu, Chuan-Hsi (author)
Materials science in semiconductor processing ; 70 ; 254-259
2017-01-01
6 pages
Article (Journal)
English
DDC:
621.38152
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