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    Correlation between oxidant concentrations, morphological aspects and etching kinetics of silicon nanowires during silver-assist electroless etching

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    Correlation between oxidant concentrations, morphological aspects and etching kinetics of silicon nanowires during silver-assist electroless etching

    New search for: Moumni, Besma

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    Correlation between oxidant concentrations, morphological aspects and etching kinetics of silicon nanowires during silver-assist electroless etching

    New search for: Moumni, Besma

    Access

    Access via TIB
    Check availability in my library
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    Document information
    Title:

    Correlation between oxidant concentrations, morphological aspects and etching kinetics of silicon nanowires during silver-assist electroless etching

    Contributors:

    Moumni, Besma (author) / Jaballah, Abdelkader Ben (author)

    Published in:

    Applied surface science ; 425 ; 1-7

    Publication date:

    2017-01-01

    Size:

    7 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.44

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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