A platform for research: civil engineering, architecture and urbanism
Nucleation and initial growth of atomic layer deposited titanium oxide determined by spectroscopic ellipsometry and the effect of pretreatment by surface barrier discharge
Nucleation and initial growth of atomic layer deposited titanium oxide determined by spectroscopic ellipsometry and the effect of pretreatment by surface barrier discharge
Nucleation and initial growth of atomic layer deposited titanium oxide determined by spectroscopic ellipsometry and the effect of pretreatment by surface barrier discharge
Cameron, David C. (author) / Krumpolec, Richard (author) / Ivanova, Tatiana V. (author) / Homola, Tomáš (author) / Černák, Mirko (author)
Applied surface science ; 345 ; 216-222
2015-01-01
7 pages
Article (Journal)
English
DDC:
620.44
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
British Library Online Contents | 2007
|Probing initial-stages of ALD growth with dynamic in situ spectroscopic ellipsometry
British Library Online Contents | 2015
|Passivation of GaAs surface by atomic-layer-deposited titanium nitride
British Library Online Contents | 2008
|British Library Online Contents | 2005