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    Growth of continuous MoS2 film with large grain size by chemical vapor deposition

    New search for: Qian, Shengya
    New search for: Yang, Ruixia
    New search for: Lan, Feifei
    New search for: Xu, Yongkuan
    New search for: Sun, Kewei
    New search for: Zhang, Song
    New search for: Zhang, Ying
    New search for: Dong, Zengyin

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    Growth of continuous MoS2 film with large grain size by chemical vapor deposition

    New search for: Qian, Shengya
    New search for: Yang, Ruixia
    New search for: Lan, Feifei
    New search for: Xu, Yongkuan
    New search for: Sun, Kewei
    New search for: Zhang, Song
    New search for: Zhang, Ying
    New search for: Dong, Zengyin

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Growth of continuous MoS2 film with large grain size by chemical vapor deposition

    New search for: Qian, Shengya
    New search for: Yang, Ruixia
    New search for: Lan, Feifei
    New search for: Xu, Yongkuan
    New search for: Sun, Kewei
    New search for: Zhang, Song
    New search for: Zhang, Ying
    New search for: Dong, Zengyin

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
    Similar titles

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    Document information
    Title:

    Growth of continuous MoS2 film with large grain size by chemical vapor deposition

    Contributors:

    Qian, Shengya (author) / Yang, Ruixia (author) / Lan, Feifei (author) / Xu, Yongkuan (author) / Sun, Kewei (author) / Zhang, Song (author) / Zhang, Ying (author) / Dong, Zengyin (author)

    Published in:

    Materials science in semiconductor processing ; 93 ; 317-323

    Publication date:

    2019-01-01

    Size:

    7 pages

    ISSN:

    1369-8001

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.38152

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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