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    Processing, microstructure and properties of chemical vapour deposited TiN/AIN films

    New search for: Yoshikawa, Noboru
    New search for: Aoki, Masato
    New search for: Kikuchi, Atsushi
    New search for: Taniguchi, Shoji

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    Processing, microstructure and properties of chemical vapour deposited TiN/AIN films

    New search for: Yoshikawa, Noboru
    New search for: Aoki, Masato
    New search for: Kikuchi, Atsushi
    New search for: Taniguchi, Shoji

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Processing, microstructure and properties of chemical vapour deposited TiN/AIN films

    New search for: Yoshikawa, Noboru
    New search for: Aoki, Masato
    New search for: Kikuchi, Atsushi
    New search for: Taniguchi, Shoji

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Processing, microstructure and properties of chemical vapour deposited TiN/AIN films

    Contributors:

    Yoshikawa, Noboru (author) / Aoki, Masato (author) / Kikuchi, Atsushi (author) / Taniguchi, Shoji (author)

    Published in:

    International journal of material & product technology ; 16 ; 109-116

    Publication date:

    2001-01-01

    Size:

    8 pages

    ISSN:

    0268-1900

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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