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    Processing, microstructure and properties of chemical vapor deposited TiN/AlN films

    New search for: Yoshikawa, N.
    New search for: Aoki, M.
    New search for: Kikuchi, A.
    New search for: Taniguchi, S.

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    Processing, microstructure and properties of chemical vapor deposited TiN/AlN films

    New search for: Yoshikawa, N.
    New search for: Aoki, M.
    New search for: Kikuchi, A.
    New search for: Taniguchi, S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Processing, microstructure and properties of chemical vapor deposited TiN/AlN films

    New search for: Yoshikawa, N.
    New search for: Aoki, M.
    New search for: Kikuchi, A.
    New search for: Taniguchi, S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

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    Check availability in my library
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    Document information
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    Document information
    Title:

    Processing, microstructure and properties of chemical vapor deposited TiN/AlN films

    Contributors:

    Yoshikawa, N. (author) / Aoki, M. (author) / Kikuchi, A. (author) / Taniguchi, S. (author)

    Published in:

    INTERNATIONAL JOURNAL OF MATERIALS AND PRODUCT TECHNOLOGY ; 16 ; 109-116

    Publication date:

    2001-01-01

    Size:

    8 pages

    ISSN:

    0268-1900

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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