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    The corrosion resistance and microstructure of UBM system-deposited NbxSiyNz thin films

    NbxSiyNz thin film nanostructure was grown using the unbalanced magnetron sputtering (UBM) technique with varying Si content. Corrosion resistance was evaluated by potentiodynamic polarisation technique in a 3% NaCl solution. Microstructure was analysed by X-ray diffraction (XRD), scanning electron microscopy (SEM) and laser scanning microscopy. Chemical composition was ascertained by X-ray fluorescence (XRF) technique. The results showed that deposition rates increased with higher Si content. A microstructural change was observed for greater than 5% Si content through the transition from a crystalline to an amorphous structure in the thin films. Corrosion test results demonstrated that the thin films having the highest silicon content had better corrosion resistance.

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    The corrosion resistance and microstructure of UBM system-deposited NbxSiyNz thin films

    NbxSiyNz thin film nanostructure was grown using the unbalanced magnetron sputtering (UBM) technique with varying Si content. Corrosion resistance was evaluated by potentiodynamic polarisation technique in a 3% NaCl solution. Microstructure was analysed by X-ray diffraction (XRD), scanning electron microscopy (SEM) and laser scanning microscopy. Chemical composition was ascertained by X-ray fluorescence (XRF) technique. The results showed that deposition rates increased with higher Si content. A microstructural change was observed for greater than 5% Si content through the transition from a crystalline to an amorphous structure in the thin films. Corrosion test results demonstrated that the thin films having the highest silicon content had better corrosion resistance.

    Access

    Download

    The corrosion resistance and microstructure of UBM system-deposited NbxSiyNz thin films

    NbxSiyNz thin film nanostructure was grown using the unbalanced magnetron sputtering (UBM) technique with varying Si content. Corrosion resistance was evaluated by potentiodynamic polarisation technique in a 3% NaCl solution. Microstructure was analysed by X-ray diffraction (XRD), scanning electron microscopy (SEM) and laser scanning microscopy. Chemical composition was ascertained by X-ray fluorescence (XRF) technique. The results showed that deposition rates increased with higher Si content. A microstructural change was observed for greater than 5% Si content through the transition from a crystalline to an amorphous structure in the thin films. Corrosion test results demonstrated that the thin films having the highest silicon content had better corrosion resistance.

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    Title:

    The corrosion resistance and microstructure of UBM system-deposited NbxSiyNz thin films

    Contributors:

    Leonardo Velasco Estrada (author) / Jhon Jairo Olaya Florez (author) / Rodolfo Rodríguez Baracaldo (author)

    Published in:

    Ingeniería e Investigación, Vol 32, Iss 3, Pp 10-13 (2012)

    Publication date:

    2012

    ISSN:

    0120-5609 , 2248-8723

    Type of media:

    Article (Journal)

    Type of material:

    Electronic Resource

    Language:

    Unknown

    Keywords:

    Corrosion , diffraction , spectroscopy , fluorescence , microstructure , microscopy , race track , x ray , thin film , sputtering , polarisation , Engineering (General). Civil engineering (General) , TA1-2040

    Metadata by DOAJ is licensed under ​CC BY-SA 1.0

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